DocumentCode
638764
Title
Investigation on anti-reflection coating for high resistance to potential induced degradation
Author
Mishina, Ken ; Ogishi, Atsufumi ; Ueno, K. ; Doi, Toshiya ; Hara, Kentaro ; Ikeno, N. ; Imai, Dai ; Saruwatari, Takuya ; Yamazaki, Tsutomu ; Ogura, Akira ; Ohshita, Yoshio ; Masuda, Atsushi
Author_Institution
Equip. Dept., Shimadzu Corp., Hadano, Japan
fYear
2013
fDate
2-5 July 2013
Firstpage
257
Lastpage
258
Abstract
This paper is focusing on a relationship between potential induced degradation (PID) and characteristics of anti-reflection coating (ARC). The module, which has an ARC deposited by plasma-enhanced chemical vapor deposition (PE-CVD) from Shimadzu Corporation, indicated high resistance to PID with keeping conventional refractive index. This ARC had a property of high conductivity and low oxygen concentration.
Keywords
antireflection coatings; plasma CVD coatings; refractive index; antireflection coating; conductivity; plasma-enhanced chemical vapor deposition; potential induced degradation; refractive index; Coatings; Conductivity; Corrosion; Degradation; Films; Resistance; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Active-Matrix Flatpanel Displays and Devices (AM-FPD), 2013 Twentieth International Workshop on
Conference_Location
Kyoto
Type
conf
Filename
6617830
Link To Document