• DocumentCode
    64052
  • Title

    Dependency of arabidopsis thaliana growth on DC electric field intensity

  • Author

    Okumura, Takashi ; Muramoto, Yoshifumi ; Shimizu, N.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Meijo Univ., Nagoya, Japan
  • Volume
    21
  • Issue
    2
  • fYear
    2014
  • fDate
    Apr-14
  • Firstpage
    913
  • Lastpage
    917
  • Abstract
    In this paper, the dependency of Arabidopsis thaliana growth on dc field intensity was studied. One group of Arabidopsis thaliana seeds was cultivated under one intensity of electric field. Four values of 2.5, 5.0, 10.0 and 15.0 kV/m were chosen for applied field intensity. Applying duration was four days. Then, seed germination rate and stem length of seedling were obtained. As a result, it is shown that dc field improves seed germination rate and seedling stem length. Also, the length of seedling stem is increased with dc field up to 10.0 kV/m with comparatively high reliability by the statistical test, while above 10.0 kV/m it seems to saturate.
  • Keywords
    bioelectric phenomena; biological effects of fields; botany; Arabidopsis thaliana growth dependency; DC electric field intensity; applied field intensity; seed germination rate; seedling; seeds; stem length; Educational institutions; Electric fields; Length measurement; Materials; Plasmas; Reliability; Zinc; Arabidopsis thaliana; Electric field; plant growth;
  • fLanguage
    English
  • Journal_Title
    Dielectrics and Electrical Insulation, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1070-9878
  • Type

    jour

  • DOI
    10.1109/TDEI.2013.004085
  • Filename
    6783087