DocumentCode
642010
Title
Multiple antiwear probes for stable and high throughput scanning probe microscope nanolithography
Author
Li, Y.F. ; Tomizawa, Yasushi ; Koga, A. ; Sugiyama, Masakazu ; Fujita, Hideaki
Author_Institution
Toshiba Corp., Kawasaki, Japan
fYear
2013
fDate
16-20 June 2013
Firstpage
2001
Lastpage
2004
Abstract
In this study, eight sets of multiscale patterns from 100 nm to tens of micrometers were successfully drawn in parallel within 30 min using our multiple antiwear probes. The total pixel number of each pattern set was 1000 × 500, corresponding to a drawing area of 100 μm × 50 μm and a drawing distance of 50 mm. Substantial improvements in the throughput, stability, and durability of scanning probe microscope lithography are demonstrated.
Keywords
electron probes; nanolithography; scanning probe microscopy; wear; durability; high throughput scanning probe microscope nanolithography; multiple antiwear probes; multiscale patterns; stable scanning probe microscope nanolithography; Contacts; Force; Lithography; Microscopy; Probes; Substrates; Throughput; Electrical contact; SPM nanolithography; mechanical contact; multiple antiwear probes; throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII), 2013 Transducers & Eurosensors XXVII: The 17th International Conference on
Conference_Location
Barcelona
Type
conf
DOI
10.1109/Transducers.2013.6627189
Filename
6627189
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