DocumentCode :
64245
Title :
Charge Retention in a Patterned {\\rm SiO}_{2}/{\\rm Si}_{3}{\\rm N}_{4} Electret
Author :
Leonov, Vladimir ; van Schaijk, R. ; Van Hoof, Chris
Author_Institution :
Imec, Body Area Networks, Leuven, Belgium
Volume :
13
Issue :
9
fYear :
2013
fDate :
Sept. 2013
Firstpage :
3369
Lastpage :
3376
Abstract :
The electret consisting of a Si3N4 pattern on a SiO2 layer is studied. A charge pattern on 1.3 μm-wide Si3N4 electret lines is successfully formed with a voltage of 80 V between charged pattern and substantially discharged SiO2. The method for making a charge pattern is optimized for reaching the highest voltage on narrow lines. A yearlong sample aging on open air shows that there is no dependence of charge retention on line width within the 1 cm-1.3 μm range. Considering the decay of surface potential during 1 year, the estimated charge lifetime in the patterned electret exceeds 75 years.
Keywords :
ageing; electrets; silicon compounds; SiO2-Si3N4; aging; charge lifetime; charge retention; charged pattern; patterned electret; size 1 cm to 1.3 mum; surface potential; voltage 80 V; Electret; inorganic electret; silicon nitride; silicon oxide;
fLanguage :
English
Journal_Title :
Sensors Journal, IEEE
Publisher :
ieee
ISSN :
1530-437X
Type :
jour
DOI :
10.1109/JSEN.2013.2263636
Filename :
6516895
Link To Document :
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