DocumentCode :
64249
Title :
Robust Compact Model for Bipolar Oxide-Based Resistive Switching Memories
Author :
Bocquet, Michael ; Deleruyelle, D. ; Aziza, H. ; Muller, Candice ; Portal, J.-M. ; Cabout, Thomas ; Jalaguier, E.
Author_Institution :
IM2NP, Aix-Marseille Univ., Marseille, France
Volume :
61
Issue :
3
fYear :
2014
fDate :
Mar-14
Firstpage :
674
Lastpage :
681
Abstract :
Emerging nonvolatile memories based on resistive switching mechanisms pull intense research and development efforts from both academia and industry. Oxide-based resistive random access memories (OxRAM) gather noteworthy performances, such as fast WRITE/READ speed, low power, high endurance, and large integration density that outperform conventional flash memories. To fully explore new design concepts, such as distributed memory in logic or biomimetic architectures, robust OxRAM compact models must be developed and implemented into electrical simulators to assess performances at a circuit level. In this paper, we propose a physics-based compact model used in electrical simulator for bipolar OxRAM memories. After uncovering the theoretical background and the set of relevant physical parameters, this model is confronted to experimental electrical data. The excellent agreement with these data suggests that this model can be confidently implemented into circuit simulators for design purpose.
Keywords :
integrated circuit modelling; low-power electronics; random-access storage; biomimetic architectures; bipolar OxRAM memories; bipolar oxide-based resistive switching memories; circuit level; circuit simulators; distributed memory; electrical simulators; flash memories; large integration density; nonvolatile memories; physics-based compact model; resistive switching mechanisms; robust compact model; write-read speed; Data models; Integrated circuit modeling; Mathematical model; Random access memory; Switches; Temperature; Temperature dependence; Bipolar switching; compact model; memory modeling; resistive RAM (RRAM); resistive switching; transition metal oxide;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2296793
Filename :
6714583
Link To Document :
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