• DocumentCode
    64445
  • Title

    Efficiency Improvement Using Thickness-Chirped Barriers in Blue InGaN Multiple Quantum Wells Light Emitting Diodes

  • Author

    Wu Tian ; Jun Zhang ; Zhujuan Wang ; Feng Wu ; Yang Li ; Shengchang Chen ; Jin Xu ; Jiangnan Dai ; Yanyan Fang ; Zhihao Wu ; Changqing Chen

  • Author_Institution
    Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technol., Wuhan, China
  • Volume
    5
  • Issue
    6
  • fYear
    2013
  • fDate
    Dec. 2013
  • Firstpage
    8200609
  • Lastpage
    8200609
  • Abstract
    The advantages of blue InGaN light-emitting diodes (LEDs) with thickness-chirped barriers in the active region have been investigated by using the Crosslight APSYS programs. The results show that the output power of the proposed LED is increased 80% and the efficiency droop is decreased from 59% in conventional LED to 28% at the current of 250 mA. Based on the analysis of electrical and optical characteristics, these improvements are mainly attributed to the change of electrostatic field in the active region by using thickness-chirped barriers. In the even-numbered barriers, the fields are increased, which gets rid of more seriously bended valence band and results in decreased barrier heights for hole transport in the active region. Furthermore, the direction of electrostatic field in the last barrier is reversed to along the drift direction of holes, which not only can lead to upbended conduction band to rise the barrier height for electron escape but also can accelerate holes to increase the hole injection current. As a result, electrons blocking and holes injection are enhanced, and in turn, the performance of the proposed LED is improved.
  • Keywords
    III-V semiconductors; conduction bands; gallium compounds; indium compounds; light emitting diodes; semiconductor quantum wells; valence bands; wide band gap semiconductors; InGaN; LED output power; barrier heights; bended valence band; blue multiple quantum well light emitting diodes; crosslight APSYS programs; drift direction; efficiency droop; electrical characteristics; electron blocking; electron escape; electrostatic field; even-numbered barriers; hole injection current; hole transport; optical characteristics; thickness-chirped barriers; upbended conduction band; Aluminum gallium nitride; Charge carrier processes; Electrostatics; Gallium nitride; Light emitting diodes; Radiative recombination; Crosslight; InGaN light-emitting diode (LED); efficiency droop; thickness-chirped barriers;
  • fLanguage
    English
  • Journal_Title
    Photonics Journal, IEEE
  • Publisher
    ieee
  • ISSN
    1943-0655
  • Type

    jour

  • DOI
    10.1109/JPHOT.2013.2285714
  • Filename
    6645412