Optical Differentiator Based on an Integrated Sidewall Phase-Shifted Bragg Grating

Author

Weifeng Zhang ; Wangzhe Li ; Jianping Yao

Author_Institution

Microwave Photonics Res. Lab., Univ. of Ottawa, Ottawa, ON, Canada

Volume

26

Issue

23

fYear

2014

fDate

Dec.1, 1 2014

Firstpage

2383

Lastpage

2386

Abstract

We report the implementation of an all-optical temporal differentiator based on an integrated phase-shifted Bragg grating (PSBG) in a compact single-mode silicon-on-insulator ridge waveguide. The integrated PSBG is designed to have a wide reflection notch by creating deep corrugations on the sidewalls of the ridge. The device is fabricated using a CMOS compatible process with 248-nm deep ultraviolet lithography. An experiment is performed. The use of the integrated PSBG for the implementation of an all-optical temporal differentiator is demonstrated.

Keywords

Bragg gratings; CMOS integrated circuits; integrated optics; light reflection; optical design techniques; optical fabrication; optical phase shifters; optical waveguides; ridge waveguides; silicon-on-insulator; ultraviolet lithography; CMOS compatible process; all-optical temporal differentiator; compact single-mode silicon-on-insulator ridge waveguide; integrated PSBG design; integrated PSBG fabrication; integrated sidewall phase-shifted Bragg grating; reflection notch; ultraviolet lithography; wavelength 248 nm; Bragg gratings; Gratings; Optical device fabrication; Optical waveguides; Reflection; Silicon; Strips; Silicon photonics; integrated Bragg grating; microwave photonics; optical differentiator; optical signal processing; waveguide;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2014.2357418

Filename

6895256