Title :
Optical Differentiator Based on an Integrated Sidewall Phase-Shifted Bragg Grating
Author :
Weifeng Zhang ; Wangzhe Li ; Jianping Yao
Author_Institution :
Microwave Photonics Res. Lab., Univ. of Ottawa, Ottawa, ON, Canada
Abstract :
We report the implementation of an all-optical temporal differentiator based on an integrated phase-shifted Bragg grating (PSBG) in a compact single-mode silicon-on-insulator ridge waveguide. The integrated PSBG is designed to have a wide reflection notch by creating deep corrugations on the sidewalls of the ridge. The device is fabricated using a CMOS compatible process with 248-nm deep ultraviolet lithography. An experiment is performed. The use of the integrated PSBG for the implementation of an all-optical temporal differentiator is demonstrated.
Keywords :
Bragg gratings; CMOS integrated circuits; integrated optics; light reflection; optical design techniques; optical fabrication; optical phase shifters; optical waveguides; ridge waveguides; silicon-on-insulator; ultraviolet lithography; CMOS compatible process; all-optical temporal differentiator; compact single-mode silicon-on-insulator ridge waveguide; integrated PSBG design; integrated PSBG fabrication; integrated sidewall phase-shifted Bragg grating; reflection notch; ultraviolet lithography; wavelength 248 nm; Bragg gratings; Gratings; Optical device fabrication; Optical waveguides; Reflection; Silicon; Strips; Silicon photonics; integrated Bragg grating; microwave photonics; optical differentiator; optical signal processing; waveguide;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2014.2357418
