• DocumentCode
    649281
  • Title

    Analysis of the interface barriers between nano metal particles and semiconductors substrates

  • Author

    Rezeq, Moh´d ; Eledlebi, Khouloud ; Ismail, Mahamod ; Lababidi, Isra

  • Author_Institution
    Technol. & Res. (Kustar), Khalifa Univ. of Sci., Abu Dhabi, United Arab Emirates
  • fYear
    2013
  • fDate
    4-7 Aug. 2013
  • Firstpage
    736
  • Lastpage
    738
  • Abstract
    Reducing the size of metal-semiconductor (M-S) contacts to sub 20 nm results in a deviation of the interface barrier characteristics from the those predicted by the conventional theory of (M-S) contacts. This is attributed to the enhancement of the electric field at the interface due to the charge confinement in the nano metal particle. We introduce analytical analysis and finite element simulations for calculating the interface parameters. The significant electric field enhancement and the reduction of the barrier thickness account for the reversed rectification behavior compared to the conventional I-V data of M-S junctions.
  • Keywords
    finite element analysis; nanoparticles; rectification; semiconductor-metal boundaries; substrates; I-V data; analytical analysis; barrier thickness reduction; charge confinement; electric field; finite element simulations; interface barrier characteristics; metal-semiconductor contacts; nano metal particles; reversed rectification; semiconductors substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems (MWSCAS), 2013 IEEE 56th International Midwest Symposium on
  • Conference_Location
    Columbus, OH
  • ISSN
    1548-3746
  • Type

    conf

  • DOI
    10.1109/MWSCAS.2013.6674754
  • Filename
    6674754