DocumentCode
649281
Title
Analysis of the interface barriers between nano metal particles and semiconductors substrates
Author
Rezeq, Moh´d ; Eledlebi, Khouloud ; Ismail, Mahamod ; Lababidi, Isra
Author_Institution
Technol. & Res. (Kustar), Khalifa Univ. of Sci., Abu Dhabi, United Arab Emirates
fYear
2013
fDate
4-7 Aug. 2013
Firstpage
736
Lastpage
738
Abstract
Reducing the size of metal-semiconductor (M-S) contacts to sub 20 nm results in a deviation of the interface barrier characteristics from the those predicted by the conventional theory of (M-S) contacts. This is attributed to the enhancement of the electric field at the interface due to the charge confinement in the nano metal particle. We introduce analytical analysis and finite element simulations for calculating the interface parameters. The significant electric field enhancement and the reduction of the barrier thickness account for the reversed rectification behavior compared to the conventional I-V data of M-S junctions.
Keywords
finite element analysis; nanoparticles; rectification; semiconductor-metal boundaries; substrates; I-V data; analytical analysis; barrier thickness reduction; charge confinement; electric field; finite element simulations; interface barrier characteristics; metal-semiconductor contacts; nano metal particles; reversed rectification; semiconductors substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems (MWSCAS), 2013 IEEE 56th International Midwest Symposium on
Conference_Location
Columbus, OH
ISSN
1548-3746
Type
conf
DOI
10.1109/MWSCAS.2013.6674754
Filename
6674754
Link To Document