DocumentCode :
649520
Title :
Lifetime of CMOS circuits evaluation by means of electro-thermal simulations
Author :
Garci, Maroua ; Kammerer, Jean-Baptiste ; Hebrard, Luc
Author_Institution :
ICube, Strasbourg, France
fYear :
2013
fDate :
25-27 Sept. 2013
Firstpage :
122
Lastpage :
126
Abstract :
An electro-thermal compact model of MOSFET which takes the hot carriers effects into account is presented in this paper. This new compact model evaluates the threshold voltage shift as well as the mobility reduction induced by the increase of the density of states at the Si/SiO2 interface produced by hot carriers. This physical effect depends on the biasing conditions and the temperature of the device. Results obtained on a single transistor are presented and compared to experimental results. Electro-thermal simulations at chip level are presented through a circuit dedicated to effective aging evaluation. Simulation results clearly show how the temperature reduces the lifetime of circuits. This new electro-thermal compact model coupled to our electro-thermal simulation tool offers the possibility to evaluate the lifetime of analog CMOS circuit.
Keywords :
CMOS integrated circuits; MOSFET; circuit simulation; elemental semiconductors; hot carriers; semiconductor device models; silicon; silicon compounds; CMOS circuit evaluation; MOSFET; Si-SiO2; Si/SiO2 interface; aging evaluation; biasing conditions; density of states; electro-thermal compact model; electro-thermal simulations; hot carriers; mobility reduction; physical effect; single transistor; threshold voltage shift;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Thermal Investigations of ICs and Systems (THERMINIC), 2013 19th International Workshop on
Conference_Location :
Berlin
Print_ISBN :
978-1-4799-2271-0
Type :
conf
DOI :
10.1109/THERMINIC.2013.6675213
Filename :
6675213
Link To Document :
بازگشت