Production of TeO2-WO3-Bi2O3 thin films for fabrication of integrated optical sensors

Author

Eiji Camilo, Mauricio ; Del Cacho, Vanessa Duarte ; Alves de Assumpcao, Thiago Alexandre ; Reyes Pires Kassab, Luciana ; Alayo, M.I.

Author_Institution

LSI, Univ. of Sao Paulo, Sao Paulo, Brazil

fYear

2013

fDate

2-6 Sept. 2013

Firstpage

1

Lastpage

4

Abstract

We present the production and characterization of TeO₂-WO₃-Bi₂O₃ thin films to be used as core layer in the fabrication of optical sensors based on Mach-Zehnder Interferometer (MZI) that has applications as pressure sensors, temperature sensors, chemical and biological sensors. The waveguides were fabricated from pedestal type obtained using conventional optical lithography procedures, followed by plasma etching and Sputtering deposition. Propagation losses around 2.0 dB/cm and 2.5 dB/cm were obtained at 633 and 1050 nm, respectively. Measurements were also performed to characterize the guide modes. Single-mode propagation at 630 and 1050 nm was observed for waveguides width up to 10 μm; larger waveguides width provided multi-mode propagation.

Keywords

bismuth compounds; chemical sensors; optical sensors; photolithography; sputter deposition; sputter etching; tellurium compounds; temperature sensors; thin films; tungsten compounds; Mach-Zehnder interferometer; TeO₂-WO₃-Bi₂O₃; biological sensors; chemical sensors; integrated optical sensors; optical lithography; plasma etching; propagation losses; single-mode propagation; sputtering deposition; temperature sensors; thin films; Mach-Zehnder Interferometer; Optical waveguides; Pedestal; Sensors; Thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronics Technology and Devices (SBMicro), 2013 Symposium on

Conference_Location

Curitiba

Print_ISBN

978-1-4799-0516-4

Type

conf

DOI

10.1109/SBMicro.2013.6676134

Filename

6676134