• DocumentCode
    650117
  • Title

    A novel cellular automaton for simulation of film deposition and etching processes

  • Author

    Colombo, F.B. ; Carreno, Marcelo Nelson Paez

  • Author_Institution
    Dept. of Electron. Syst. Eng., Univ. of Sao Paulo, Sao Paulo, Brazil
  • fYear
    2013
  • fDate
    2-6 Sept. 2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Extending previous research, this work describes a novel cellular automaton for simulation of several deposition and etching processes, such as SiO2 PECVD and isotropic Si etching. The cellular automaton is an alternative to several automata presented in the literature. As an application test, the cellular automaton proposed here is used in order to simulate the fabrication of a coplanar waveguide (CPW) with a flexible RF shield and a bulk micromachined Si microtip.
  • Keywords
    coplanar waveguides; etching; plasma CVD coatings; silicon compounds; CPW; PECVD; SiO2; cellular automaton; coplanar waveguide; etching processes; film deposition; flexible RF shield; Simulation; cellular automaton; deposition; etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronics Technology and Devices (SBMicro), 2013 Symposium on
  • Conference_Location
    Curitiba
  • Print_ISBN
    978-1-4799-0516-4
  • Type

    conf

  • DOI
    10.1109/SBMicro.2013.6676149
  • Filename
    6676149
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=650117