Title :
A novel cellular automaton for simulation of film deposition and etching processes
Author :
Colombo, F.B. ; Carreno, Marcelo Nelson Paez
Author_Institution :
Dept. of Electron. Syst. Eng., Univ. of Sao Paulo, Sao Paulo, Brazil
Abstract :
Extending previous research, this work describes a novel cellular automaton for simulation of several deposition and etching processes, such as SiO2 PECVD and isotropic Si etching. The cellular automaton is an alternative to several automata presented in the literature. As an application test, the cellular automaton proposed here is used in order to simulate the fabrication of a coplanar waveguide (CPW) with a flexible RF shield and a bulk micromachined Si microtip.
Keywords :
coplanar waveguides; etching; plasma CVD coatings; silicon compounds; CPW; PECVD; SiO2; cellular automaton; coplanar waveguide; etching processes; film deposition; flexible RF shield; Simulation; cellular automaton; deposition; etching;
Conference_Titel :
Microelectronics Technology and Devices (SBMicro), 2013 Symposium on
Conference_Location :
Curitiba
Print_ISBN :
978-1-4799-0516-4
DOI :
10.1109/SBMicro.2013.6676149
