DocumentCode :
65311
Title :
An Oxygen Gettering Scheme for Improving Device Mobility and Subthreshold Swing of InGaZnO-Based Thin-Film Transistor
Author :
Hsiao-Hsuan Hsu ; Chun-Yen Chang ; Chun-Hu Cheng ; Shan-Haw Chiou ; Chiung-Hui Huang ; Yu-Chien Chiu
Author_Institution :
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
13
Issue :
5
fYear :
2014
fDate :
Sept. 2014
Firstpage :
933
Lastpage :
938
Abstract :
This study involved developing a low-power and high-mobility metal-oxide thin-film transistor that incorporated a bilayer IGZO/IGZO:Ti semiconductor material. Compared with control metal-oxide TFTs, the bilayer IGZO TFT through thickness modulation of IGZO:Ti can reach the smallest subthreshold swing (85 mV/decade) and the highest field effect mobility (49 cm2/Vs) at a drive voltage of <;3 V. This performance level improvement can be attributed to the gettering effect caused by the IGZO:Ti capping layer and its dual advantages, which enhance device mobility and improve gate swing.
Keywords :
gallium compounds; getters; indium compounds; ternary semiconductors; thin film transistors; zinc compounds; InGaZnO; capping layer; device mobility; drive voltage; field effect mobility; gettering effect; metal-oxide thin film transistor; oxygen gettering scheme; subthreshold swing; Dielectrics; Gettering; Iron; Logic gates; Performance evaluation; Thin film transistors; Zinc; Gettering; InGaZnO (IGZO); thin-film transistor (TFT); titanium oxide (TiOx);
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2014.2332395
Filename :
6841632
Link To Document :
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