DocumentCode
65464
Title
Simulation of Bipolar Transistor Degradation at Various Dose Rates and Electrical Modes for High Dose Conditions
Author
Zebrev, Gennady I. ; Petrov, Alexander S. ; Useinov, Rustem G. ; Ikhsanov, Renat S. ; Ulimov, Viktor N. ; Anashin, Vasily S. ; Elushov, Ilya V. ; Drosdetsky, Maxim G. ; Galimov, Almaz Mirzanurovich
Author_Institution
Dept. of Microand Nanoelectron., Nat. Res. Nucl. Univ., Moscow, Russia
Volume
61
Issue
4
fYear
2014
fDate
Aug. 2014
Firstpage
1785
Lastpage
1790
Abstract
Radiation response of bipolar devices irradiated under various electrical modes and dose rates at high doses has been studied. A nonlinear numerical model including ELDRS effects and electric field reduction at high doses has been developed and validated. Dose degradation of a bipolar transistor´s gain factor at different dose rates and electrical modes has been simulated and explained in a unified way, based on dependence of the charge yield in isolation oxides on dose rates and electric fields. It has been shown that at high doses one needs to use a nonlinear, self-consistent numerical approach, accounting for simultaneous suppression of the oxide electric field induced by trapped charge. Correspondingly, two types of degradation saturation have been revealed: (i) due to simultaneous thermal annealing, and (ii) due to total dose dependent electric field reduction in oxides. The former implies proportionality of the saturation dose and degradation level to dose rate, the latter permits dose rate independent saturation levels of degradation.
Keywords
annealing; bipolar transistors; isolation technology; ELDRS; bipolar transistor degradation; bipolar transistor gain factor; dose conditions; dose degradation; dose rates; electric field reduction; electrical modes; isolation oxides; nonlinear numerical model; oxide electric field; radiation response; thermal annealing; Annealing; Bipolar transistors; Degradation; Equations; Mathematical model; Radiation effects; Silicon; Annealing; ELDRS; bipolar devices; dose rate effects; modeling; radiation effects in devices; simulation; total dose effects;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2014.2315672
Filename
6841645
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