• DocumentCode
    65539
  • Title

    Measurements and Simulations of Low Dark Count Rate Single Photon Avalanche Diode Device in a Low Voltage 180-nm CMOS Image Sensor Technology

  • Author

    Leitner, Thomas ; Feiningstein, A. ; Turchetta, R. ; Coath, Rebecca ; Chick, Steven ; Visokolov, G. ; Savuskan, V. ; Javitt, M. ; Gal, Laszlo ; Brouk, Igor ; Bar-Lev, Sharon ; Nemirovsky, Yael

  • Author_Institution
    TOWERJAZZ Specialty Foundry, Migdal Haemek, Israel
  • Volume
    60
  • Issue
    6
  • fYear
    2013
  • fDate
    Jun-13
  • Firstpage
    1982
  • Lastpage
    1988
  • Abstract
    This paper presents the key features of single photon avalanche diode (SPAD) devices fabricated in a low voltage commercial 180-nm CMOS image sensor technology exhibiting very low dark count rate (DCR). The measured DCR is <; 100 Hz at room temperature even for excess voltages above 2 V. The active junction of the SPAD measures 10 μm in diameter within a 24-μm test structure. The active region where Geiger avalanche occurs is determined by an implanted charge sheet. Edge avalanche is averted by utilizing a virtual guard ring, formed by the retrograde well profile. The design, measurements, and simulations of doping and electric field profiles that lead to such low DCR are reported and analyzed. The current-voltage characteristics and the temperature dependence of the breakdown voltage provide further, indirect evidence for the low DCR measured in the device. Thus, the key features of measured good SPADs are presented and are correlated with simulations that give physical insight on how to design high-performance SPADs.
  • Keywords
    CMOS image sensors; avalanche diodes; doping profiles; electric breakdown; semiconductor device testing; DCR measurement; Geiger avalanche; SPAD active junction; SPAD device fabrication; breakdown voltage; charge sheet implantation; current-voltage characteristics; doping simulations; edge avalanche; electric field profiles; high-performance SPAD design; low dark count rate single photon avalanche diode device measurements; low dark count rate single photon avalanche diode device simulations; low voltage commercial CMOS image sensor technology; size 10 mum; size 180 nm; size 24 mum; temperature 293 K to 298 K; temperature dependence; test structure; virtual guard ring; Avalanche breakdown; image sensors; photodiodes; semiconductor device measurement; single photon avalanche diode (SPAD);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2259172
  • Filename
    6517019