Printed silicon broadband membrane reflectors by laser interference lithography

We report on printed silicon photonic crystal broadband membrane reflectors (MRs) based on laser interference lithography (LIL) patterning. Single-layer photonic crystal membrane which was formed by the LIL technique on a silicon-on-insulator (SOI) wafer was transferred by the contact printing method using the polydimethylsiloxane (PDMS) stamp on a glass substrate. These broadband silicon-MRs show high-reflectivity of 95 % around 1200 nm wavelength with bandwidth of about 100 nm. This simplest and easiest method to fabricate broadband MRs has great potential for many types of optoelectronic and photonic devices.