DocumentCode :
657022
Title :
Homogeneous and sharp Si nanoprobe array fabricated on (111) silicon wafer
Author :
Xiao Zhang ; Xiao Yu ; Yi Wang ; Tie Li ; Yuelin Wang
Author_Institution :
State Key Labs. of Transducer Technol., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
fYear :
2013
fDate :
3-6 Nov. 2013
Firstpage :
1
Lastpage :
4
Abstract :
This work presents a novel fabrication method for homogeneous and sharp nanoprobe array on (111) silicon wafer. Utilizing the specific spatial structure of {111} planes and self-limiting procedure, the probe can be made with precisely controlled size requiring only a series of conventional semiconductor processes (dry etching of silicon by DRIE, anisotropic wet etching by potassium hydroxide solution and thermal-oxidation-based tip sharpening). The fabricated probe is composed of a pyramid-shaped base and a sharp tip. The diameter of the tip is less than 30 nm, with a vertex angle less than 18°.
Keywords :
biomedical electrodes; nanoelectromechanical devices; nanofabrication; probes; silicon; sputter etching; DRIE; Si; anisotropic wet etching; conventional semiconductor process; deep reactive ion etching; dry etching; fabrication method; homogeneous nanoprobe array; pyramid shaped base; self-limiting procedure; sharp nanoprobe array; sharp tip; thermal oxidation based tip sharpening; Arrays; Cavity resonators; Fabrication; Probes; Silicon; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SENSORS, 2013 IEEE
Conference_Location :
Baltimore, MD
ISSN :
1930-0395
Type :
conf
DOI :
10.1109/ICSENS.2013.6688303
Filename :
6688303
Link To Document :
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