DocumentCode :
657340
Title :
4H-SiC Schottky contact improvement for temperature sensor applications
Author :
Draghici, F. ; Badila, M. ; Brezeanu, G. ; Pristavu, G. ; Rusu, Irena ; Craciunoiu, F. ; Pascu, R.
Author_Institution :
Politeh. Univ. of Bucharest, Bucharest, Romania
Volume :
2
fYear :
2013
fDate :
14-16 Oct. 2013
Firstpage :
163
Lastpage :
166
Abstract :
An improvement in performance of 4H-SiC Schottky diodes using a Ni metal is proposed. The effects of the Schottky and ohmic contacts´ annealing process conditions are investigated through electrical characterization of the diodes. A thermal treatment at 800°C leads to devices with stable and reproducible electrical behavior. A high performance temperature sensor based on these 4H-SiC Schottky diode has been proved.
Keywords :
Schottky diodes; annealing; heat treatment; ohmic contacts; silicon compounds; temperature sensors; wide band gap semiconductors; 4H-SiC Schottky contact improvement; 4H-SiC Schottky diodes; SiC; diode electrical characterization; electrical behavior; high-performance temperature sensor; nickel metal; ohmic contact annealing process condition; temperature 800 degC; thermal treatment; Annealing; Nickel; Schottky barriers; Schottky diodes; Silicon carbide; Temperature measurement; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference (CAS), 2013 International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4673-5670-1
Electronic_ISBN :
1545-827X
Type :
conf
DOI :
10.1109/SMICND.2013.6688645
Filename :
6688645
Link To Document :
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