• DocumentCode
    661549
  • Title

    Validated electro-thermal simulations of two different power MOSFET technologies and implications on their robustness

  • Author

    de Filippis, Stefano ; Illing, Robert ; Nelhiebel, Michael ; Decker, Stefan ; Kock, Helmut ; Irace, Andrea

  • Author_Institution
    KAI - Kompetenzzentrum Automobil- und Ind.-Elektron. GmbH, Villach, Austria
  • fYear
    2013
  • fDate
    26-30 May 2013
  • Firstpage
    325
  • Lastpage
    328
  • Abstract
    Power MOSFETs integrated in modern Smart Power switches feature a substantial high current capability due to the very low value of their transconductance coefficient K. In this paper we demonstrate that the trend related to the increasing current capability implies a reduced thermal stability range which may lead to less robust devices. Electro-thermal simulations of two test chips featuring two different technologies show that the higher the value of K, the less stable the device thermal behavior. Simulation results have been validated by means of temperature measurements performed using an integrated temperature sensor.
  • Keywords
    power MOSFET; power integrated circuits; temperature sensors; integrated temperature sensor; modern smart power switches; power MOSFET technologies; robustness; temperature measurements; thermal stability; transconductance coefficient; validated electro-thermal simulations; Computational modeling; Finite element analysis; MOSFET; Temperature distribution; Temperature measurement; Temperature sensors; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs (ISPSD), 2013 25th International Symposium on
  • Conference_Location
    Kanazawa
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4673-5134-8
  • Type

    conf

  • DOI
    10.1109/ISPSD.2013.6694414
  • Filename
    6694414