DocumentCode :
661549
Title :
Validated electro-thermal simulations of two different power MOSFET technologies and implications on their robustness
Author :
de Filippis, Stefano ; Illing, Robert ; Nelhiebel, Michael ; Decker, Stefan ; Kock, Helmut ; Irace, Andrea
Author_Institution :
KAI - Kompetenzzentrum Automobil- und Ind.-Elektron. GmbH, Villach, Austria
fYear :
2013
fDate :
26-30 May 2013
Firstpage :
325
Lastpage :
328
Abstract :
Power MOSFETs integrated in modern Smart Power switches feature a substantial high current capability due to the very low value of their transconductance coefficient K. In this paper we demonstrate that the trend related to the increasing current capability implies a reduced thermal stability range which may lead to less robust devices. Electro-thermal simulations of two test chips featuring two different technologies show that the higher the value of K, the less stable the device thermal behavior. Simulation results have been validated by means of temperature measurements performed using an integrated temperature sensor.
Keywords :
power MOSFET; power integrated circuits; temperature sensors; integrated temperature sensor; modern smart power switches; power MOSFET technologies; robustness; temperature measurements; thermal stability; transconductance coefficient; validated electro-thermal simulations; Computational modeling; Finite element analysis; MOSFET; Temperature distribution; Temperature measurement; Temperature sensors; Thermal stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices and ICs (ISPSD), 2013 25th International Symposium on
Conference_Location :
Kanazawa
ISSN :
1943-653X
Print_ISBN :
978-1-4673-5134-8
Type :
conf
DOI :
10.1109/ISPSD.2013.6694414
Filename :
6694414
Link To Document :
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