DocumentCode
661549
Title
Validated electro-thermal simulations of two different power MOSFET technologies and implications on their robustness
Author
de Filippis, Stefano ; Illing, Robert ; Nelhiebel, Michael ; Decker, Stefan ; Kock, Helmut ; Irace, Andrea
Author_Institution
KAI - Kompetenzzentrum Automobil- und Ind.-Elektron. GmbH, Villach, Austria
fYear
2013
fDate
26-30 May 2013
Firstpage
325
Lastpage
328
Abstract
Power MOSFETs integrated in modern Smart Power switches feature a substantial high current capability due to the very low value of their transconductance coefficient K. In this paper we demonstrate that the trend related to the increasing current capability implies a reduced thermal stability range which may lead to less robust devices. Electro-thermal simulations of two test chips featuring two different technologies show that the higher the value of K, the less stable the device thermal behavior. Simulation results have been validated by means of temperature measurements performed using an integrated temperature sensor.
Keywords
power MOSFET; power integrated circuits; temperature sensors; integrated temperature sensor; modern smart power switches; power MOSFET technologies; robustness; temperature measurements; thermal stability; transconductance coefficient; validated electro-thermal simulations; Computational modeling; Finite element analysis; MOSFET; Temperature distribution; Temperature measurement; Temperature sensors; Thermal stability;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and ICs (ISPSD), 2013 25th International Symposium on
Conference_Location
Kanazawa
ISSN
1943-653X
Print_ISBN
978-1-4673-5134-8
Type
conf
DOI
10.1109/ISPSD.2013.6694414
Filename
6694414
Link To Document