DocumentCode
662058
Title
RF performance of ultra low power junctionless MOSFETs
Author
Ghosh, Debashis ; Parihar, Manoj Singh ; Kranti, Abhinav
Author_Institution
Low Power Nanoelectron. Res. Group, Indian Inst. of Technol., Indore, Indore, India
fYear
2013
fDate
5-8 Nov. 2013
Firstpage
787
Lastpage
789
Abstract
In this work, we report on the doping dependence of RF performance metrics of junctionless transistors and compare the same with conventional undoped inversion mode MOSFETs. It is demonstrated that at low drive currents (~ 25 μA/μm), JL transistors outperform inversion mode MOSFETs as 20% to 40% higher values of cut-off frequency is obtained for all doping concentrations (1019 cm3 to 3×1019 cm3). It is shown that the junctionless device architecture is advantageous for ultra low power RF applications as parasitic capacitances are significantly reduced. Scaling trends for cut-off frequency (at lower drain currents) with respect to gate length highlights the potential of junctionless architecture for ultra low power applications.
Keywords
MOSFET; low-power electronics; semiconductor doping; RF performance; doping concentration; junctionless device architecture; junctionless transistor; lower drain current; parasitic capacitance; ultra low power junctionless MOSFET; undoped inversion mode MOSFET; Capacitance; Doping; Logic gates; Low-power electronics; MOSFET; Radio frequency; Double Gate MOSFET; Junctionless; RF; Ultra Low Power;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference Proceedings (APMC), 2013 Asia-Pacific
Conference_Location
Seoul
Type
conf
DOI
10.1109/APMC.2013.6694932
Filename
6694932
Link To Document