• DocumentCode
    662058
  • Title

    RF performance of ultra low power junctionless MOSFETs

  • Author

    Ghosh, Debashis ; Parihar, Manoj Singh ; Kranti, Abhinav

  • Author_Institution
    Low Power Nanoelectron. Res. Group, Indian Inst. of Technol., Indore, Indore, India
  • fYear
    2013
  • fDate
    5-8 Nov. 2013
  • Firstpage
    787
  • Lastpage
    789
  • Abstract
    In this work, we report on the doping dependence of RF performance metrics of junctionless transistors and compare the same with conventional undoped inversion mode MOSFETs. It is demonstrated that at low drive currents (~ 25 μA/μm), JL transistors outperform inversion mode MOSFETs as 20% to 40% higher values of cut-off frequency is obtained for all doping concentrations (1019 cm3 to 3×1019 cm3). It is shown that the junctionless device architecture is advantageous for ultra low power RF applications as parasitic capacitances are significantly reduced. Scaling trends for cut-off frequency (at lower drain currents) with respect to gate length highlights the potential of junctionless architecture for ultra low power applications.
  • Keywords
    MOSFET; low-power electronics; semiconductor doping; RF performance; doping concentration; junctionless device architecture; junctionless transistor; lower drain current; parasitic capacitance; ultra low power junctionless MOSFET; undoped inversion mode MOSFET; Capacitance; Doping; Logic gates; Low-power electronics; MOSFET; Radio frequency; Double Gate MOSFET; Junctionless; RF; Ultra Low Power;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference Proceedings (APMC), 2013 Asia-Pacific
  • Conference_Location
    Seoul
  • Type

    conf

  • DOI
    10.1109/APMC.2013.6694932
  • Filename
    6694932