DocumentCode :
662058
Title :
RF performance of ultra low power junctionless MOSFETs
Author :
Ghosh, Debashis ; Parihar, Manoj Singh ; Kranti, Abhinav
Author_Institution :
Low Power Nanoelectron. Res. Group, Indian Inst. of Technol., Indore, Indore, India
fYear :
2013
fDate :
5-8 Nov. 2013
Firstpage :
787
Lastpage :
789
Abstract :
In this work, we report on the doping dependence of RF performance metrics of junctionless transistors and compare the same with conventional undoped inversion mode MOSFETs. It is demonstrated that at low drive currents (~ 25 μA/μm), JL transistors outperform inversion mode MOSFETs as 20% to 40% higher values of cut-off frequency is obtained for all doping concentrations (1019 cm3 to 3×1019 cm3). It is shown that the junctionless device architecture is advantageous for ultra low power RF applications as parasitic capacitances are significantly reduced. Scaling trends for cut-off frequency (at lower drain currents) with respect to gate length highlights the potential of junctionless architecture for ultra low power applications.
Keywords :
MOSFET; low-power electronics; semiconductor doping; RF performance; doping concentration; junctionless device architecture; junctionless transistor; lower drain current; parasitic capacitance; ultra low power junctionless MOSFET; undoped inversion mode MOSFET; Capacitance; Doping; Logic gates; Low-power electronics; MOSFET; Radio frequency; Double Gate MOSFET; Junctionless; RF; Ultra Low Power;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference Proceedings (APMC), 2013 Asia-Pacific
Conference_Location :
Seoul
Type :
conf
DOI :
10.1109/APMC.2013.6694932
Filename :
6694932
Link To Document :
بازگشت