DocumentCode :
665198
Title :
Modeling of tunneling currents on Al/SiO2/p-Si MOS capacitors with nanometer-thick oxides
Author :
Mulyanti, Budi ; Hasanah, Lilik ; Pantjawati, Arjuni B. ; Murakami, H. ; Khairurrijal
Author_Institution :
Dept. of Electr. Eng. Educ., Indonesia Univ. of Educ. (UPI), Bandung, Indonesia
fYear :
2013
fDate :
7-8 Nov. 2013
Firstpage :
265
Lastpage :
268
Abstract :
In this paper, the tunneling current calculations of isotropic and anisotropic-isotropic electron effective mass on Al/SiO2/p-Si MOS involving coupling effect are presented. The results indicated that the impact of tunneling calculation involving coupling effect is that electron velocity acts as parameter of calculation, especially in inversion condition. In this condition, the difference between anisotropic-isotropic and isotropic calculation results tends to be greater when the electron velocity increases. The result of anisotropic-isotropic model is closer to the theory than that of isotropic result. In addition, the coupling effect makes the values of tunneling current more sensitive to the electron effective mass.
Keywords :
MOS capacitors; aluminium; elemental semiconductors; silicon; silicon compounds; tunnelling; Al-SiO2-Si; MOS capacitor; anisotropic-isotropic electron effective mass; coupling effect; electron velocity; inversion condition; isotropic electron effective mass; nanometer-thick oxide; tunneling current modeling; Couplings; Effective mass; Mathematical model; Metals; Semiconductor device modeling; Silicon; Tunneling; Al/SiO2/p-Si MOS; anisotropic; effective mass; isotropic; tunneling current;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Instrumentation, Communications, Information Technology, and Biomedical Engineering (ICICI-BME), 2013 3rd International Conference on
Conference_Location :
Bandung
Print_ISBN :
978-1-4799-1649-8
Type :
conf
DOI :
10.1109/ICICI-BME.2013.6698505
Filename :
6698505
Link To Document :
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