Title :
Eye-diagram simulation and analysis of a high-speed TSV-based channel
Author :
Heegon Kim ; Jonghyun Cho ; Kim, Jonghoon J. ; Jung, Daniel H. ; Sumin Choi ; Joungho Kim ; Junho Lee ; Kunwoo Park
Author_Institution :
TERA Lab., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Abstract :
In this paper, the worst-case and statistical eye-diagrams of high-speed TSV-based channel are simulated and analyzed. To analyze the electrical characteristic of TSV-based channel, the eye-diagrams with various TSV and silicon interposer interconnect structures are simulated and compared each other. In addition, the single-channel bandwidth in accordance with the channel types and the metal widths of the silicon interposer interconnect are investigated based on the simulated eye-diagrams. By using the obtained single-channel bandwidth of the high-speed TSV-based channel, the escaping bandwidth that corresponds to the total bandwidth of the TSV-based system is also investigated.
Keywords :
elemental semiconductors; integrated circuit interconnections; silicon; three-dimensional integrated circuits; high-speed TSV-based channel; silicon interposer interconnect structures; statistical eye diagram simulation; through-silicon-via technology; worst-case eye diagram; Bandwidth; Capacitance; Metals; Resistance; Silicon; Through-silicon vias; Timing jitter; escaping bandwidth; high-speed TSV-based channel; statistical eye-diagram; worst-case eye-diagram;
Conference_Titel :
3D Systems Integration Conference (3DIC), 2013 IEEE International
Conference_Location :
San Francisco, CA
DOI :
10.1109/3DIC.2013.6702327