• DocumentCode
    671200
  • Title

    Improvement in dielectric properties of bilayer ZnO/MgO films deposited by Sol-Gel technique

  • Author

    Habibah, Z. ; Wahid, M.H. ; Ismail, L.N. ; Bakar, Rohani Abu ; Rozana, M.D. ; Rusop, M.

  • Author_Institution
    NANO-Electron. Centre (NET), Univ. Teknol. MARA, Shah Alam, Malaysia
  • fYear
    2013
  • fDate
    25-27 Sept. 2013
  • Firstpage
    285
  • Lastpage
    288
  • Abstract
    Magnesium oxide and bilayer ZnO/MgO dielectrics film were successfully deposited using spin coating technique. The effect of MgO layer thickness towards prepared dielectric films behaviour was determined by controlling the deposition time. The comparison of the MgO and ZnO/MgO dielectrics film properties shows that the bilayer ZnO/MgO with 238nm MgO layer thickness shows better dielectrics properties compared to others. This was due to its small surface roughness which resulted in better electrical properties that have high resistivity and low leakage current. Optimized bilayer ZnO/MgO film was then used as the dielectrics film for fabrication of organic capacitor. Capacitor performance was determined via capacitance-voltage (C-V) analysis at different frequency applied and it revealed that, the capacitance value increased from 2.4pF to 10pF with addition of PVDF-TrFE organic ferroelectric layer on bilayer ZnO/MgO film caused by high polarization produced in the film.
  • Keywords
    II-VI semiconductors; capacitance; dielectric polarisation; dielectric thin films; electrical resistivity; ferroelectric capacitors; leakage currents; magnesium compounds; polymers; sol-gel processing; spin coating; surface roughness; wide band gap semiconductors; zinc compounds; MgO layer thickness effect; PVDF-TrFE organic ferroelectric layer addition; ZnO-MgO; ZnO-MgO dielectric film properties; bilayer ZnO-MgO dielectric film; capacitance-voltage analysis; capacitor performance; deposition time; dielectric film behaviour; electrical properties; leakage current; magnesium oxide dielectric film; optimized bilayer ZnO-MgO film; organic capacitor fabrication; resistivity; size 238 nm; sol-gel technique; spin coating technique; surface roughness; Capacitors; Conductivity; Dielectric films; Leakage currents; Zinc oxide; BilayerZnO/MgO; Dielectric Properties; Organic Capacitor; PVDF-TrFE; Sol-gel;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro and Nanoelectronics (RSM), 2013 IEEE Regional Symposium on
  • Conference_Location
    Langkawi
  • Print_ISBN
    978-1-4799-1181-3
  • Type

    conf

  • DOI
    10.1109/RSM.2013.6706531
  • Filename
    6706531