DocumentCode :
671342
Title :
Underfill adhesion enhancement via optimization of plasma treatment for 3DIC
Author :
Chi-Tung Yeh ; Huei-Nuan Huang ; Pai-Yuan Lee ; Mu-Hsuan Chan ; Lin, G.T. ; Chiu, Shengfen
Author_Institution :
Siliconware Precision Ind. Co., Ltd., Taichung, Taiwan
fYear :
2013
fDate :
22-25 Oct. 2013
Firstpage :
327
Lastpage :
329
Abstract :
For the advanced 3DIC packages with features as large die dimension and fine bump pitch, plasma was difficult to penetrate into the center of package. Plasma power, treating time, and gas flow rate were evaluated in this study to enhance the penetration ability of oxygen radical. Contact angle measurement was taken to judge the treatment effect. For the package with die size beyond 25 × 25 mm, contact angle on the organic substrate beneath die could be decreased to 40 degree via recipe optimizing. For high I/O count package with 40 um stand-off height and 45μm pitch, decrease of contact angle at internal surface was also achieved. Shear test presented that the adhesion was enhanced via optimized plasma treatment.
Keywords :
contact angle; flip-chip devices; optimisation; surface cleaning; three-dimensional integrated circuits; 3DIC packages; contact angle measurement; fine bump pitch; gas flow rate; large die dimension; optimization; organic substrate; oxygen radical; plasma power; plasma treatment; shear test; size 40 mum; treating time; underfill adhesion enhancement; Adhesives; Plasma measurements; Plasmas; Silicon; Substrates; Surface treatment; Vehicles;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2013 8th International
Conference_Location :
Taipei
ISSN :
2150-5934
Type :
conf
DOI :
10.1109/IMPACT.2013.6706678
Filename :
6706678
Link To Document :
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