DocumentCode :
674814
Title :
Large post-growth energy band-gap tuning of the 980 nm high power laser diode structures
Author :
Tang Xiaohong ; Qiao Zhongliang ; Lim Peng Huei ; Bo baoxue
Author_Institution :
OPTIMUS: Photonics Center of Excellence, Nanyang Technol. Univ., Singapore, Singapore
fYear :
2013
fDate :
28-30 Nov. 2013
Firstpage :
453
Lastpage :
457
Abstract :
Post-growth energy band gap turning of the 980nm high power semiconductor laser structure through the quantum well intermixing (QWI) has been investigated. The QWI was carried out by depositing a thin film of SiO2 on top surface of the laser structure samples and followed by high temperature annealing. By using the QWI technique, band gap energy of the 980nm quantum well structure has been blue shifted up to >220nm. High quality of the laser diode structure after the QWI has been confirmed by fabricating the high performance semiconductor lasers using the wafer after the QWI.
Keywords :
annealing; energy gap; gallium arsenide; indium compounds; laser tuning; optical fabrication; quantum well lasers; silicon compounds; QWI; SiO2-In0.24Ga0.76As0.52P0.48-In0.24Ga0.76As-GaAs; blue shifting; high performance semiconductor laser fabrication; high power laser diode structures; high temperature annealing; large post-growth energy bandgap tuning; quantum well intermixing; thin film deposition; wavelength 980 nm; Annealing; Indium gallium arsenide; Photonic band gap; Quantum well lasers; Temperature measurement; Tuning; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical and Electronics Engineering (ELECO), 2013 8th International Conference on
Conference_Location :
Bursa
Print_ISBN :
978-605-01-0504-9
Type :
conf
DOI :
10.1109/ELECO.2013.6713883
Filename :
6713883
Link To Document :
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