DocumentCode :
675595
Title :
Experimental comparative study between the diamond MOSFET and its conventional counterpart in high temperatures environment
Author :
Galembeck, Egon H. S. ; Renaux, Christian ; Flandre, Denis ; Gimenez, Salvador Pinillos
Author_Institution :
FEI, São Bernardo do Campo, Brazil
fYear :
2013
fDate :
7-10 Oct. 2013
Firstpage :
1
Lastpage :
2
Abstract :
An experimental comparative study of the high temperature effects between the diamond SOI MOSFET (DSM) and conventional SOI MOSFET (CSM) counterparts is performed. The Diamond layout style has demonstrated better electrical performance in high temperatures environment, mainly for high-frequency analog IC applications, regarding the same gate area, aspect ratio and bias conditions. This can be justified due to the longitudinal corner effect (LCE) and PAMDLE (parallel association of MOSFETS with different channel lengths) effects remain active in the diamond layout style at high temperature.
Keywords :
MOSFET; diamond; silicon-on-insulator; wide band gap semiconductors; C; Si; channel lengths; conventional SOI MOSFET; diamond SOI MOSFET; diamond layout style; electrical performance; high temperature environment; high-frequency analog IC applications; longitudinal corner effect; Diamonds; Electric fields; Junctions; Layout; Logic gates; MOSFET; Performance evaluation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), 2013 IEEE
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/S3S.2013.6716568
Filename :
6716568
Link To Document :
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