Title :
Configurable Logic Gates Using Polarity-Controlled Silicon Nanowire Gate-All-Around FETs
Author :
De Marchi, Michele ; Jian Zhang ; Frache, Stefano ; Sacchetto, Davide ; Gaillardon, Pierre-Emmanuel ; Leblebici, Yusuf ; De Micheli, G.
Author_Institution :
Lab. of Integrated Syst., Ecole Polytech. Fed. de Lausanne, Lausanne, Switzerland
Abstract :
This letter demonstrates the first fabricated four-transistor logic gates using polarity-configurable, gate-all-around silicon nanowire transistors. This technology enhances conventional CMOS functionality by adding the degree of freedom of dynamic polarity control n- or p-type. In addition, devices are fabricated with low, uniform doping profiles, reducing constraints at scaled technology nodes. We demonstrate through measurements and simulations how this technology can be applied to fabricate logic gates with fewer resources than CMOS. In particular, full-swing output XOR and NAND logic gates are demonstrated using the same physical four-transistor circuit.
Keywords :
field effect transistors; logic gates; nanowires; CMOS functionality; NAND logic gates; doping profiles; dynamic polarity control; four-transistor logic gates; full-swing output XOR logic gates; polarity-configurable gate-all-around silicon nanowire transistors; polarity-controlled silicon nanowire gate-all-around FET; scaled technology nodes; Delays; Geometry; Integrated circuit modeling; Logic gates; Performance evaluation; Silicon; Transistors; Ambipolar transistor; XOR logic gate; XOR logic gate.; double-gate; dual-gate; gate-all-around (GAA); polarity control; post-CMOS; silicon nanowire (SiNW); top-down fabrication;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2014.2329919