Title :
Self-Aligned Electrodes on SU-8 Negative Photoresist Pedestals
Author :
Fok, H. Raymond ; Jackson, Thomas N.
Author_Institution :
Dept. of Electr. Eng., Pennsylvania State Univ., University Park, PA, USA
Abstract :
We report a novel technique by which self-aligned thin-film electrodes are fabricated on SU-8 negative photoresist pedestals. A bilayer aluminum and titanium structure is used to align the thin-film electrode and to serve as the optical mask for the UV exposure of the SU-8. The SU-8 developer is used to remove both the unexposed SU-8 and the bilayer structure of aluminum and titanium. The result is a thin-film electrode aligned on an SU-8 pedestal with a minimal undercut beneath the thin-film electrode.
Keywords :
aluminium; electrodes; masks; micromechanical devices; photoresists; self-assembly; thin films; titanium; Al-Ti; SU-8 developer; SU-8 negative photoresist pedestals; UV exposure; bilayer aluminum-titanium structure; optical mask; self-aligned thin-film electrodes; unexposed SU-8; Aluminum; Electrodes; Etching; Micromechanical devices; Resists; Titanium; Bio-MEMS; MEMS; SU-8; SU-8.; negative photoresist; self-aligned;
Journal_Title :
Microelectromechanical Systems, Journal of
DOI :
10.1109/JMEMS.2014.2313723
