Title :
Field plate termination for high voltage diamond Schottky diode
Author :
Arbess, Houssam ; Isoird, K.
Author_Institution :
LAAS, Univ. de Toulouse, Toulouse, France
Abstract :
New field plate architecture is applied to pseudo vertical diamond Schottky diode. New topology structure has been proposed and simulated using Sentaurus TCAD simulation in order to minimize the maximum electric field in the dielectric at high voltage operation. Firstly and after simple variations in the field plate architecture, the breakdown voltage was improved from 1632 V to 2141 V at 700 K. Concerning Emax in the dielectric, we obtained high decreasing of the maximum electric field following the policy of pressure distribution.
Keywords :
Schottky diodes; diamond; electric fields; Sentaurus TCAD simulation; field plate architecture; field plate termination; high voltage diamond Schottky diode; maximum electric field; pressure distribution policy; pseudovertical diamond Schottky diode; temperature 700 K; topology structure; voltage 1632 V to 2141 V; Aluminum oxide; Diamonds; Dielectrics; Electric fields; Schottky diodes; Silicon; Silicon carbide;
Conference_Titel :
Microelectronics (ICM), 2013 25th International Conference on
Conference_Location :
Beirut
Print_ISBN :
978-1-4799-3569-7
DOI :
10.1109/ICM.2013.6735017