DocumentCode
680653
Title
Field plate termination for high voltage diamond Schottky diode
Author
Arbess, Houssam ; Isoird, K.
Author_Institution
LAAS, Univ. de Toulouse, Toulouse, France
fYear
2013
fDate
15-18 Dec. 2013
Firstpage
1
Lastpage
4
Abstract
New field plate architecture is applied to pseudo vertical diamond Schottky diode. New topology structure has been proposed and simulated using Sentaurus TCAD simulation in order to minimize the maximum electric field in the dielectric at high voltage operation. Firstly and after simple variations in the field plate architecture, the breakdown voltage was improved from 1632 V to 2141 V at 700 K. Concerning Emax in the dielectric, we obtained high decreasing of the maximum electric field following the policy of pressure distribution.
Keywords
Schottky diodes; diamond; electric fields; Sentaurus TCAD simulation; field plate architecture; field plate termination; high voltage diamond Schottky diode; maximum electric field; pressure distribution policy; pseudovertical diamond Schottky diode; temperature 700 K; topology structure; voltage 1632 V to 2141 V; Aluminum oxide; Diamonds; Dielectrics; Electric fields; Schottky diodes; Silicon; Silicon carbide;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics (ICM), 2013 25th International Conference on
Conference_Location
Beirut
Print_ISBN
978-1-4799-3569-7
Type
conf
DOI
10.1109/ICM.2013.6735017
Filename
6735017
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