DocumentCode :
682189
Title :
Research on the calibration technique of on-wafer load-pull system
Author :
Luan Peng ; Liang Faguo ; Han Zhiguo ; Li Jingqiang ; Qiao Yu´e
Author_Institution :
Hebei Semicond. Res. Inst., Shijiazhuang, China
Volume :
1
fYear :
2013
fDate :
16-19 Aug. 2013
Firstpage :
436
Lastpage :
440
Abstract :
By using load-pull technique, non-linear device behavior can be obtained through changing the source impedance or load impedance. Load-pull system is so complex that there is no effective way for its performance metrology, which results in significant variance of device parameter, such as power, gain, and PAE. This paper discusses in-situ calibration of on-wafer load-pull system and provides the verified result. The technique mentioned in this paper can calibrate the performance of the on-wafer load-pull system reliably and roundly, and give the measurement uncertainty of the system. Thus the calibration scheme is more reasonable, while the measurement result is more reliable.
Keywords :
calibration; measurement uncertainty; calibration; load impedance; measurement uncertainty; nonlinear device behavior; on-wafer load-pull system; source impedance; Calibration; Impedance; Measurement uncertainty; Scattering parameters; Semiconductor device measurement; Standards; Uncertainty; calibration; load-pull; on-wafer; transfer standards;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Measurement & Instruments (ICEMI), 2013 IEEE 11th International Conference on
Conference_Location :
Harbin
Print_ISBN :
978-1-4799-0757-1
Type :
conf
DOI :
10.1109/ICEMI.2013.6743023
Filename :
6743023
Link To Document :
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