DocumentCode
682966
Title
Recrystallized silicon thin-film solar cells on zircon ceramics
Author
Schillinger, Kai ; Janz, Siegfried ; Reber, Stefan
Author_Institution
Fraunhofer Inst. for Solar Energy Syst. (ISE), Freiburg, Germany
fYear
2013
fDate
16-21 June 2013
Firstpage
1784
Lastpage
1787
Abstract
This work describes the processing of recrystallized silicon thin-film solar cells and its typical defects. Zircon (ZrSiO4) ceramic substrates of technical grade with potential production costs of <; 20 €/m2 were used. Those substrates were encapsulated in crystalline silicon carbide, deposited by atmospheric pressure chemical vapor deposition (APCVD). The active silicon layers were also formed using APCVD. Zone-melting recrystallization (ZMR) was used to enlarge Si grains. Si films crystallized on SiC show characteristic Σ3 twin grain boundaries parallel to the growth direction. The Si crystals achieve widths up to several mm and lengths of several cm. Solar cells made from such material achieved open circuit voltages up to 566 mV on zircon and up to 600 mV on equally processed mc-Si.
Keywords
ceramics; chemical vapour deposition; elemental semiconductors; silicon compounds; solar cells; thin film devices; twin boundaries; zirconium compounds; zone melting recrystallisation; APCVD; SiC; ZMR; ZrSiO4; active silicon layers; atmospheric pressure chemical vapor deposition; crystalline silicon carbide; encapsulation; open circuit voltages; potential production costs; silicon crystals; silicon thin-film solar cells; twin grain boundaries; zircon ceramics; zone melting recrystallization; Ceramics; Epitaxial growth; Photovoltaic cells; Silicon; Silicon carbide; Substrates; crystalline silicon thin-film solar cells; low-cost ceramics; zone-melting recrystallization;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
Conference_Location
Tampa, FL
Type
conf
DOI
10.1109/PVSC.2013.6744489
Filename
6744489
Link To Document