DocumentCode :
683177
Title :
Effects of surface roughness on aluminum local back surface field silicon wafer solar cells
Author :
Yu-Hsuan Lin ; Sung-Yu Chen ; Chen-Hsun Du ; Shih-Peng Hsu ; Bing-Cyun Chen ; Der-Chin Wu
Author_Institution :
Green Energy & Environ. Res. Lab. (GEL), Ind. Technol. Res. Inst. (ITRI), Hsinchu, Taiwan
fYear :
2013
fDate :
16-21 June 2013
Firstpage :
2227
Lastpage :
2229
Abstract :
Screen-printed aluminum local back surface field (Al-LBSF) solar cells are a promising candidate for high-efficiency industrial silicon-based solar cells. For improving the conversion efficiency, industrial LBSF cell process flows typically comprise rear side planarization to reduce the surface roughness. In this paper, we investigate the influences of rear surface topographies on wet chemical polishing LBSF cells. The best conversion efficiency of 19.09% on screen-printed LBSF cell with polished rear surface was demonstrated.
Keywords :
aluminium; elemental semiconductors; planarisation; polishing; silicon; solar cells; surface roughness; thick films; aluminum local back surface field silicon wafer solar cells; conversion efficiency; rear side planarization; rear surface topography; screen printing; surface roughness; wet chemical polishing; Optical surface waves; Photovoltaic cells; Rough surfaces; Silicon; Surface roughness; Surface topography; Surface treatment; aluminium oxide; local back surface field; passivation; silicon solar cell; surface roughness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
Conference_Location :
Tampa, FL
Type :
conf
DOI :
10.1109/PVSC.2013.6744919
Filename :
6744919
Link To Document :
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