Title :
Ultra-thin GaAs single-junction solar cells integrated with an AlInP layer for reflective back scattering
Author :
Weiquan Yang ; Becker, Jurgen ; Ying-Shen Kuo ; Jing-Jing Li ; Shi Liu ; Landini, Barbara ; Campman, Ken ; Yong-Hang Zhang
Author_Institution :
Center for Photonics Innovation, Arizona State Univ., Tempe, AZ, USA
Abstract :
This paper proposes and demonstrates the use of a textured and lattice-matched semiconductor layer coated with a Au reflector for reflective back scattering to enhance the efficiency of single-junction solar cells with ultra-thin absorbers. The device structure studied in this work consists of an In0.49Ga0.51P/GaAs/In0.49Ga0.51P double-heterostructure single-junction solar cell with a GaAs absorber of either 300 nm or 1000 nm thick, as well as a textured Al0.52In0.48P layer coated with a highly reflective Au film. The devices, areas ranging from 0.3×0.3 mm2 to 1×1 mm2, are flip-chip bonded onto Si carrier substrates, covered by a contact metal grid (with a 9.7% or 10.7% shadow area for the 300 nm and 1000 nm devices, respectively) and a MgF2/ZnS anti-reflective coating. Both types of device designs demonstrate an open-circuit voltage of 1.00 V, short-circuit current densities of 24.5 and 26.1 mA/cm2, and power conversion efficiencies of 19.1% and 20.6%, respectively; these measurements are carried out under 1 sun solar radiation (AM 1.5G, 0.1 W/cm2). It is reasonable to expect that the short-circuit current densities and conversion efficiencies of these devices could reach 26.6 mA/cm2 and 28.6 mA/cm2, and 20.7% and 22.6%, respectively, when a typical contact grid layout with 2% surface coverage is used. These short-circuit current densities are only 3.6 and 1.6 mA/cm2 lower than the maximum theoretical value 30.2 mA/cm2, respectively.
Keywords :
aluminium compounds; antireflection coatings; current density; gallium arsenide; gold; indium compounds; magnesium compounds; solar cells; zinc compounds; Al0.52In0.48P; AlInP; Au; In0.49Ga0.51P-GaAs-In0.49Ga0.51P; MgF2-ZnS; antireflective coating; carrier substrates; contact grid layout; contact metal grid; device designs; efficiency 19.1 percent; efficiency 20.6 percent; flip-chip; heterostructure solar cell; lattice-matched semiconductor layer; open-circuit voltage; reflective back scattering; reflective film; short-circuit current densities; size 100 nm; size 300 nm; sun solar radiation; surface coverage; textured semiconductor layer; ultra-thin single-junction solar cells; voltage 1.00 V; Coatings; Current measurement; Gallium arsenide; Photovoltaic cells; Scattering; Surface texture; gallium arsenide; photovoltaic cell; surface texture; thin film devices;
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2013 IEEE 39th
Conference_Location :
Tampa, FL
DOI :
10.1109/PVSC.2013.6745163