• DocumentCode
    683611
  • Title

    Comparative study on delineation of Cu-Al intermetallic using chemical treatment and ion milling

  • Author

    Lai-Seng Yeoh ; Kok-Cheng Chong ; Li, Sinan

  • Author_Institution
    Spansion (Penang) Sdn. Bhd., Bayan Lepas, Malaysia
  • fYear
    2013
  • fDate
    11-13 Dec. 2013
  • Firstpage
    143
  • Lastpage
    146
  • Abstract
    Intermetallic (IMC) is an alloy formed between two or more metals. Understanding IMC growth and formation is important in determining the bond integrity and the conductivity between metals. While Au-Al IMC is easily detected, Cu-Al IMC is hardly seen due to a slower interdiffusion rate between Cu and Al. This Cu-Al IMC can create a big challenge in analyzing suspected wire bond to bond pad interface failures, since defects may be difficult to find, and it makes delineating the different phases of IMC layers difficult. These limitations may lead to inaccurate findings and may result in invalid analysis conclusions. Chemical treatment has been proposed to be a good approach for IMC delineation. We evaluated the solution of hydrochloric acid (HCI) and isopropyl alcohol (IPA) with five different mixing ratios (4:1, 3:1, 2:1, 1:1, and 0:1 by volume) to delineate the Cu-Al IMC. Another methodology, focused ion beam (FIB) ion milling, is a surface preparation technique which uses an ion beam to strip away an extensive two-dimensional surface area for microscopic analysis. A comparative study was performed between chemical treatment and ion milling on the success of delineation of the Cu-Al IMC. Chemical treatment is a lower cost method which provides IMC delineation at a wider area (entire bonding interface), while ion milling is a higher cost method which does at a smaller area (selected bonding region). Both techniques are found to be very useful in IMC analysis for failure mechanism identification and root cause determination.
  • Keywords
    aluminium alloys; chemical interdiffusion; copper alloys; focused ion beam technology; integrated circuit metallisation; integrated circuit packaging; integrated circuit reliability; lead bonding; milling; surface treatment; Cu-Al; bond integrity; bond pad interface failure; chemical treatment; failure mechanism identification; focused ion beam ion milling; hydrochloric acid; interdiffusion rate; intermetallic compound; intermetallic delineation; isopropyl alcohol; surface preparation technique; wire bond failure; Conferences; Decision support systems; Electronics packaging;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference (EPTC 2013), 2013 IEEE 15th
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4799-2832-3
  • Type

    conf

  • DOI
    10.1109/EPTC.2013.6745701
  • Filename
    6745701