• DocumentCode
    683633
  • Title

    Low temperature bonding studies of Au-studs and AuSn-solder bumps on Au-surface using ultrasonic energy

  • Author

    Jie Li Aw ; Jong Bum Lee ; Jaafar, Norkamal ; Mian Zhi Ding ; Li-Shiah Lim ; Chong Ser Choong ; Rao, V. Srinivasa

  • Author_Institution
    Inst. of Microelectron., A*STAR (Agency for Sci., Technol. & Res.), Singapore, Singapore
  • fYear
    2013
  • fDate
    11-13 Dec. 2013
  • Firstpage
    384
  • Lastpage
    388
  • Abstract
    Conventional flip chip bonding requires heating process to enable solder to melt and electrically conductive adhesives to cure. Applying ultrasonic dose, successful flip chip bonding can be achieved at lower temperatures and bonding pressures. Using ultrasonic flip chip bonding is attractive as the reduction in bonding temperature reduces processing time, by reducing time taken for ramping up and cooling down of bonding arm in thermal compression; it also reduces the mismatch of coefficient of thermal expansion (CTE) between the chip and substrate during bonding compared to thermal compression bond and flux and reflow process. In this study, feasibility of room-temperature ultrasonic flip chip bonding of eutectic AuSn solder and Au-stud bumps was evaluated. Design of experiment was carried out on Argon and Hydrogen plasma process as a pre-flip chip cleaning treatment. Investigation of critical ultrasonic flip chip bonding parameters such as ultrasonic power, bonding force and chuck temperature was carried out. In the full manuscript, details of the experimental trials and results of room-temperature bonding of Au-studs and eutectic AuSn solder bumps on Au-surface would be discussed.
  • Keywords
    flip-chip devices; gold compounds; solders; thermal expansion; ultrasonic bonding; AuSn; CTE; argon plasma process; bonding arm; bonding force; bonding pressures; chuck temperature; coefficient of thermal expansion; eutectic solder bumps; flux process; heating process; hydrogen plasma process; low temperature bonding studies; pre-flip chip cleaning treatment; reflow process; temperature 293 K to 298 K; thermal compression bond; ultrasonic energy; ultrasonic flip chip bonding; ultrasonic power; Acoustics; Bonding; Cleaning; Flip-chip devices; Plasma temperature; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference (EPTC 2013), 2013 IEEE 15th
  • Conference_Location
    Singapore
  • Print_ISBN
    978-1-4799-2832-3
  • Type

    conf

  • DOI
    10.1109/EPTC.2013.6745747
  • Filename
    6745747