DocumentCode :
684145
Title :
The effects of Si-doping on the properties of CaCu3Ti4O12 ceramics
Author :
Jinqiang He ; Hui Wang ; Chunjiang Lin ; Jiajun Lin ; Shengtao Li
Author_Institution :
State Key Lab. of Electr. Insulation & Power Equip., Xi´an Jiaotong Univ., Xi´an, China
fYear :
2013
fDate :
20-23 Oct. 2013
Firstpage :
599
Lastpage :
602
Abstract :
CaCu3Ti4O12 (CCTO) ceramics as a dielectric material are of potential applications in capacitors and memory devices, however, how to further improve the dielectric properties of CCTO ceramics is still a challenge. The dielectric behavior of this material can be manipulated via the modification in composition, and Si as a glass phase should have an impact on the properties of CCTO ceramics, this work investigated the effects of Si-doping on CaCu3Ti4O12 with the aim of improving dielectric characteristics. CaCu3Ti4O12 ceramics of various Si-doping concentrations were synthesized by solid state reaction method at 1050 C. The microstructure and the dielectric properties of Si-doped and undoped CaCu3Ti4O12 were studied. It is found that the added silicon can be incorporated into the structure of CaCu3Ti4O12, a certain amount of Si-doping would facilitate the grain growth, promote the precipitation of intergranular phase, and improve the compactness and homogeneity of CaCu3Ti4O12 ceramics. Si-doped CaCu3Ti4O12 samples show significantly higher dielectric constant, accompanied by larger dielectric loss. The temperature dependence of dielectric permittivity ε" for various frequencies shows three successive sets of peaks attributed to intrinsic relaxation polarization processes, suggesting that Si-doping has little influence on the relaxation mechanism of CaCu3Ti4O12 ceramics.
Keywords :
calcium compounds; copper compounds; dielectric relaxation; elemental semiconductors; permittivity; semiconductor doping; silicon; titanium compounds; CCTO ceramics; CaCu3Ti4O12; Si; Si-doping; capacitors; dielectric characteristics; dielectric constant; dielectric loss; dielectric material; dielectric permittivity; dielectric properties; glass phase; grain growth; homogeneity; intergranular phase precipitation; intrinsic relaxation polarization processes; memory devices; microstructure; relaxation mechanism; solid state reaction method; temperature dependence; Ceramics; Dielectric constant; Grain boundaries; Microstructure; Silicon; Solids; CaCu3Ti4O12; Si-doping; dielectric properties;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electrical Insulation and Dielectric Phenomena (CEIDP), 2013 IEEE Conference on
Conference_Location :
Shenzhen
Type :
conf
DOI :
10.1109/CEIDP.2013.6748227
Filename :
6748227
Link To Document :
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