DocumentCode
68673
Title
Localization of Joule Heating in Phase-Change Memory With Incorporated Nanostructures and Nanolayer for Reducing Reset Current
Author
You Yin ; Tao Wang
Author_Institution
Div. of Electron. & Inf., Gunma Univ., Kiryu, Japan
Volume
62
Issue
7
fYear
2015
fDate
Jul-15
Firstpage
2184
Lastpage
2189
Abstract
In this paper, we intensively investigated the proposed nanocontact phase-change memory (nano-C PCM) with incorporated nanostructures and high-resistivity nanolayer (nano-L) for reducing reset current. The high resistivity was able to be tuned by doping N into the conventional Ge2Sb2Te5 phase-change material. The analysis based on finite-element method exhibited that the current density in the nano-C PCM could be locally enhanced to about two times that of both conventional and nano-L PCM devices. This resulted in the localization of Joule heating in the nano-C PCM, making it have the highest temperature at the same programming current among the three types of PCM devices. Reset current of nano-C PCM could be greatly reduced to 8.2% of that of the conventional one, owing to its high-efficiency heating for amorphization.
Keywords
antimony compounds; current density; finite element analysis; germanium compounds; nanostructured materials; phase change materials; phase change memories; Ge2Sb2Te5; Joule heating; amorphization; current density; finite-element method; high-resistivity nanolayer; nano-C PCM; nanocontact phase-change memory; nanostructures and; phase-change material; programming current; reset current; Conductivity; Current density; Heating; Nanoscale devices; Nanostructures; Phase change materials; Random access memory; Low reset current; nanostructure; phase-change memory (PCM); phase-change memory (PCM).;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2015.2429689
Filename
7109871
Link To Document