DocumentCode
688826
Title
Surpassing the optical diffraction limit with photo-inhibited super-resolution (PInSR) lithography
Author
Forman, Darren L. ; Cole, Michael C. ; McLeod, Robert R.
Author_Institution
Dept. of Electr., Comput., & Energy Eng., Univ. of Colorado at Boulder, Boulder, CO, USA
fYear
2013
fDate
9-14 June 2013
Firstpage
1
Lastpage
2
Abstract
We present our progress towards nano-patterning with focused visible and near-UV light, using a novel photo-polymerizable resist. Special attention will be given to the difficulties presented by diffusion of reactive photo-generated molecules.
Keywords
biodiffusion; light diffraction; nanopatterning; nanophotonics; optical fabrication; optical focusing; optical polymers; photochemistry; photoresists; ultraviolet spectra; visible spectra; nanopatterning; near-ultraviolet light focusing; optical diffraction limit; photoinhibited superresolution lithography; photopolymerizable resist; reactive photogenerated molecule diffusion; visible light focusing; Biomedical optical imaging; Laser beams; Lithography; Optical diffraction; Optical polymers; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6833202
Link To Document