DocumentCode :
68915
Title :
External Electric Field Assisted Ultraviolet Irradiation for Bonding of Lubricant Film on Magnetic Disks
Author :
Tani, Hiroshi ; Sakane, Yasuo ; Koganezawa, Shinji ; Tagawa, Norio
Author_Institution :
Dept. of Mech. Eng., Kansai Univ., Suita, Japan
Volume :
50
Issue :
11
fYear :
2014
fDate :
Nov. 2014
Firstpage :
1
Lastpage :
4
Abstract :
In this paper, we sought to determine if, during ultraviolet (UV) exposure, the external electric field could control the bonded lubricant thickness. During UV irradiation, the effect of the external electric field on both the bonded lubricant thickness and surface free energy was studied. The lubricant films after UV irradiation were analyzed using time-of-flight secondary ion mass spectroscopy (TOF-SIMS). Because of the negative electric field, the polar component of the surface free energy was reduced, while the bonded lubricant thickness increased. Based on the results of the TOF-SIMS analysis, we concluded that these findings resulted from the negative electric field accelerating the photoelectron emission, and because of these photoelectrons, the bonding between the end groups and diamond-like carbon surface increased.
Keywords :
bonding processes; diamond-like carbon; liquid films; lubricants; photoelectron spectra; secondary ion mass spectra; surface energy; time of flight mass spectra; ultraviolet radiation effects; C; TOF-SIMS analysis; UV irradiation; bonding; diamond-like carbon surface; external electric field assisted ultraviolet irradiation; lubricant film; magnetic disks; photoelectron emission; surface free energy; time-of-flight secondary ion mass spectroscopy; ultraviolet exposure; Acceleration; Bonding; Electrodes; Lubricants; Radiation effects; Surface treatment; Temperature measurement; Head-disk interface; magnetic disk; photoelectron emission; ultraviolet (UV);
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2014.2318015
Filename :
6971404
Link To Document :
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