• DocumentCode
    689583
  • Title

    Thermal stress in silica disk resonators

  • Author

    Tong Chen ; Hansuek Lee ; Vahala, Kerry J.

  • Author_Institution
    T.J. Watson Lab. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
  • fYear
    2013
  • fDate
    9-14 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We investigate how thermal stress impacts silica disk resonators by comparing measurements with a finite element and an analytical model. Thicker oxide layers and proper control of undercut enable ultrahigh optical performance and mechanical stability.
  • Keywords
    finite element analysis; mechanical stability; optical design techniques; optical resonators; silicon compounds; stress effects; thermal stresses; SiO2; analytical model; finite element model; mechanical stability; silica disk resonators; thermal stress; thick oxide layers; ultrahigh optical performance; undercut control; Optical imaging; Optical resonators; Q-factor; Silicon; Silicon compounds; Stress; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2013 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6833970
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=689583