Title :
Thermal stress in silica disk resonators
Author :
Tong Chen ; Hansuek Lee ; Vahala, Kerry J.
Author_Institution :
T.J. Watson Lab. of Appl. Phys., California Inst. of Technol., Pasadena, CA, USA
Abstract :
We investigate how thermal stress impacts silica disk resonators by comparing measurements with a finite element and an analytical model. Thicker oxide layers and proper control of undercut enable ultrahigh optical performance and mechanical stability.
Keywords :
finite element analysis; mechanical stability; optical design techniques; optical resonators; silicon compounds; stress effects; thermal stresses; SiO2; analytical model; finite element model; mechanical stability; silica disk resonators; thermal stress; thick oxide layers; ultrahigh optical performance; undercut control; Optical imaging; Optical resonators; Q-factor; Silicon; Silicon compounds; Stress; Thermal stresses;
Conference_Titel :
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location :
San Jose, CA
