• DocumentCode
    689650
  • Title

    Development of a coherent EUV scatterometry microscope

  • Author

    Kinoshita, Hiroyuki ; Harada, Tatsuya ; Nagata, Yuichi ; Watanabe, Toshio ; Midorikawa, Katsumi

  • Author_Institution
    Center for EUV Lithography, Univ. of Hyogo, Kamigori, Japan
  • fYear
    2013
  • fDate
    9-14 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    EUV coherent scatterometry microscopy (CSM) systems has been developed. The CSM system employs a high-order harmonic generation (HHG) 13.5 nm coherent source to detect pattern defects and measure the CD of patterns. The resolution of pattern defects and repeatability of CD measurement are 20 nm and 0.1 nm, respectively.
  • Keywords
    light coherence; optical harmonic generation; optical microscopy; CD measurement; CSM system; EUV coherent scatterometry microscopy systems; HHG; coherent source; high-order harmonic generation; pattern defect detection; pattern defect resolution; wavelength 13.5 nm; Diffraction; Inspection; Microscopy; Radar measurements; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2013 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6834037
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=689650