DocumentCode
689724
Title
A large area polymer-based substrate with broadband absorption for surface enhanced Raman scattering
Author
Ming Yang ; Qiang Wu ; Jiwei Qi ; Zhandong Chen ; Jingjun Xu
Author_Institution
TEDA Appl. Phys. Sch. & Sch. of Phys., Nankai Univ., Tianjin, China
fYear
2013
fDate
9-14 June 2013
Firstpage
1
Lastpage
2
Abstract
We fabricate a large area (3 × 3 cm2) polydimethylsiloxane-based substrate for surface-enhanced Raman scattering by combining femtosecond laser microstructuring and soft lithography techniques. The substrate exhibits broadband absorption in the region of 350-1000 nm and reproducible enhancement factor ~107.
Keywords
high-speed optical techniques; laser materials processing; optical fabrication; optical polymers; soft lithography; surface enhanced Raman scattering; broadband absorption; femtosecond laser microstructuring; large area polydimethylsiloxane-based substrate; large area polymer-based substrate; reproducible enhancement factor; soft lithography; surface enhanced Raman scattering; wavelength 350 nm to 1000 nm; Absorption; Fabrication; Gold; Raman scattering; Silicon; Substrates; Ultrafast optics;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics (CLEO), 2013 Conference on
Conference_Location
San Jose, CA
Type
conf
Filename
6834111
Link To Document