• DocumentCode
    690146
  • Title

    Nanolithography based on two-surface-plasmon-polariton-absorption

  • Author

    Yunxiang Li ; Fang Liu ; Long Xiao ; Yidong Huang

  • Author_Institution
    Dept. of Electron. Eng., Tsinghua Univ., Beijing, China
  • fYear
    2013
  • fDate
    9-14 June 2013
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Nanolithography utilizing the nonlinear absorption of two surface plasmon polaritons in resists has been demonstrated. The linewidth of ~λ0/11 are achieved by illuminating the plasmonic mask with the femtosecond laser, which is potential for future nanofabrication.
  • Keywords
    high-speed optical techniques; masks; nanofabrication; nanolithography; photoresists; polaritons; surface plasmons; femtosecond laser; linewidth; nanofabrication; nanolithography; nonlinear absorption; plasmonic mask; resists; two-surface plasmon polariton absorption; Interference; Lighting; Nanolithography; Plasmons; Resists; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics (CLEO), 2013 Conference on
  • Conference_Location
    San Jose, CA
  • Type

    conf

  • Filename
    6834539
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=690146