Title :
A Novel Compact High-Voltage LDMOS Transistor Model for Circuit Simulation
Author :
Shi, Longxing ; Jia, Kan ; Sun, Weifeng
Author_Institution :
Nat. Applic.-Specific Integrated Circuit (ASIC) Syst. Eng. Res. Center, Southeast Univ., Nanjing, China
Abstract :
A novel compact lateral double-diffused MOSFET (LDMOS) transistor model is presented in this paper. In contrast to other LDMOS models, the drift region part of this model is developed according to a surface-potential-based description of the drift region underneath the gate oxide. The model gives a complete description for all operation regimes while keeping a relatively simplified analytical expression of the current. A nodal charge model is also included for the time-dependent behavior of devices. The proposed complete LDMOS model is validated by comparison with numerical device simulations and measured data of the actual LDMOS devices. The comparison results demonstrate that the new model gives accurate descriptions for both dc and ac characteristics of LDMOS transistors.
Keywords :
MOSFET; circuit simulation; numerical analysis; semiconductor device models; LDMOS transistor model; ac characteristics; circuit simulation; compact high-voltage LDMOS transistor model; compact lateral double-diffused MOSFET transistor model; dc characteristics; drift region model; gate oxide; nodal charge model; numerical device simulations; surface-potential-based description; time-dependent behavior; Computational modeling; Data models; Integrated circuit modeling; Logic gates; Mathematical model; Numerical models; Semiconductor device modeling; Compact modeling; drift region; high voltage; lateral double-diffused MOSFETs (LDMOS); surface potential;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2012.2227116