DocumentCode
69175
Title
Analysis of Threshold Current Behavior for Bulk and Quantum-Well Germanium Laser Structures
Author
Yan Cai ; Zhaohong Han ; Xiaoxin Wang ; Camacho-Aguilera, R.E. ; Kimerling, Lionel C. ; Michel, J. ; Jifeng Liu
Author_Institution
Microphotonics Center, Massachusetts Inst. of Technol., Cambridge, MA, USA
Volume
19
Issue
4
fYear
2013
fDate
July-Aug. 2013
Firstpage
1901009
Lastpage
1901009
Abstract
We analyze the optical gain of tensile-strained, n-germanium (n-Ge) material taking bandgap narrowing (BGN) for heavily doped Ge into account. Both the direct bandgap and indirect bandgap are narrowed by 60 meV. Our new modeling explains the wide lasing spectrum of 1520-1700 nm in electrically pumped Ge lasers. The calculated materials gain can reach 1000 cm-1 when the injected carrier density is ~mid-1019 cm-3 with a combination of 0.25% tensile strain and 4.5×1019 cm-3 n-type doping. The threshold current density is estimated to be 0.53 kA/cm2 for an optimized edge-emitting double-heterojunction Ge device, comparable to bulk III-V lasers. We also review current progress on Ge quantum-well (QW) structures. The threshold current density of most Ge QW structures is similar to bulk Ge. Only tensile-strained QWs show reduced threshold currents.
Keywords
elemental semiconductors; germanium; optical pumping; quantum well lasers; Ge; bandgap narrowing; bulk laser structure; electrically pumped laser; optical gain; quantum well laser structure; tensile-strain analysis; threshold current; wavelength 1520 nm to 1700 nm; Absorption; Charge carrier density; Doping; Free electron lasers; Photonic band gap; Threshold current; Diode lasers; germanium (Ge); integrated optoelectronics; quantum-well (QW) lasers;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2013.2247573
Filename
6470629
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