DocumentCode :
692159
Title :
Heat dissipation mechanisms in resistive switching devices
Author :
Yalon, E. ; Ritter, Daniel ; Riess, I.
Author_Institution :
Electr. Eng. Dept., Technion - Israel Inst. of Technol., Haifa, Israel
fYear :
2013
fDate :
12-14 Aug. 2013
Firstpage :
1
Lastpage :
4
Abstract :
The local temperature plays a key role in resistive switching devices. We have previously presented a method to experimentally evaluate the filament temperature using metal-insulator-semiconductor bipolar transistor structure. In light of the experimental results, we discuss here the various possible heat dissipation mechanisms, and compare thermal simulations to the measured temperatures. The simulations are consistent with our experimental data for a filament tip diameter of ~1nm.
Keywords :
bipolar transistors; cooling; random-access storage; semiconductor device packaging; Joule heating; heat dissipation mechanism; metal-insulator-semiconductor bipolar transistor structure; resistive RAM; resistive switching devices; thermal simulations; Bipolar transistors; Electrodes; Heating; Switches; Thermal conductivity; Thermal resistance; Tunneling; Joule heating; RRAM; bipolar transistor; conductive filaments; resistive switching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Memory Technology Symposium (NVMTS), 2013 13th
Conference_Location :
Minneapolis, MN
Type :
conf
DOI :
10.1109/NVMTS.2013.6851051
Filename :
6851051
Link To Document :
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