DocumentCode :
6939
Title :
Total-Ionizing-Dose Effects on the Resistance Switching Characteristics of Chalcogenide Programmable Metallization Cells
Author :
Gonzalez-Velo, Y. ; Barnaby, H.J. ; Kozicki, M.N. ; Dandamudi, P. ; Chandran, Anandkumar ; Holbert, K.E. ; Mitkova, M. ; Ailavajhala, M.
Author_Institution :
Sch. of Electr., Arizona State Univ., Tempe, AZ, USA
Volume :
60
Issue :
6
fYear :
2013
fDate :
Dec. 2013
Firstpage :
4563
Lastpage :
4569
Abstract :
Programmable metallization cells (PMCs) are emerging ReRAM devices exhibiting resistance switching due to cation transport in a solid-state electrolyte and redox reactions at the electrodes. Their non-volatility and low power requirements have led to increased interest in their development for non-volatile memory applications. Investigation of the total dose response of PMCs will contribute to our understanding of radiation induced effects in these novel memory devices as well as assess their suitability for use in ionizing radiation environments. This work investigates the impact of total ionizing dose on the switching characteristic of silver doped Ge30Se70 PMC memory devices. The results obtained show that the resistance switching characteristic of these cells which use a solid state electrolyte based on Ge30Se70 is not affected by a total dose exposure of up to 10 Mrad( Ge30Se70).
Keywords :
electrodes; germanium compounds; oxidation; radiation hardening (electronics); random-access storage; reduction (chemical); silver; solid electrolytes; Ge30Se70:Ag; PMC memory devices; ReRAM devices; cation transport; chalcogenide programmable metallization cells; electrodes; ionizing radiation environments; nonvolatility memory; radiation induced effects; redox reactions; resistance switching characteristics; solid-state electrolyte; total dose response; total-ionizing-dose effects; Memristors; Metallization; Nonvolatile memory; Radiation effects; Resistance; Cation; ECM; PMC; ReRAM; chalcogenide glass; electrochemical metallization; memristors; nanoionic memory; photo-diffusion; photodoping; programmable metallization cell; radiation effects; resistive switching; total ionizing dose;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2013.2286318
Filename :
6678245
Link To Document :
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