Title :
Design and analysis for ThruChip design for manufacturing (DFM)
Author :
Li-Chung Hsu ; Take, Yasuhiro ; Kosuge, Atsutake ; Hasegawa, So ; Kadamoto, Junichiro ; Kuroda, Tadahiro
Author_Institution :
Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama, Japan
Abstract :
A 1GB/s ThruChip interface (TCI) test chip for wafer thinning, power mesh, and dummy metal fill impacts are analyzed and evaluated with test chip measurement and field solver simulation. The measurement results show that TCI coil dimension can be sized down as wafer thinning by following D/Z=3 rule. However, the experiment shows 20% power reduction by enlarging TCI coil (D/Z=6). The power mesh lies between TCI coils can dramatically decrease the TCI magnetic pulse strength and hence cause TCI to fail. Dummy metal within TCI coils has no impact on TCI transmission.
Keywords :
design for manufacture; three-dimensional integrated circuits; TCI magnetic pulse strength; ThruChip design for manufacturing; ThruChip interface test chip; dummy metal fill impacts; power mesh; wafer thinning; Coils; Couplings; Current measurement; Eddy currents; Metals; Power measurement; Semiconductor device measurement;
Conference_Titel :
Design Automation Conference (ASP-DAC), 2015 20th Asia and South Pacific
Conference_Location :
Chiba
Print_ISBN :
978-1-4799-7790-1
DOI :
10.1109/ASPDAC.2015.7058979
