DocumentCode :
69762
Title :
Computational Study of Effects of Surface Roughness and Impurity Scattering in Si Double-Gate Junctionless Transistors
Author :
Ichii, Masato ; Ishida, Ryoma ; Tsuchiya, Hideaki ; Kamakura, Yoshinari ; Mori, Nobuya ; Ogawa, Matsuto
Author_Institution :
Dept. of Electr. & Electron. Eng., Kobe Univ., Kobe, Japan
Volume :
62
Issue :
4
fYear :
2015
fDate :
Apr-15
Firstpage :
1255
Lastpage :
1261
Abstract :
Electron transport in Si double-gate junctionless transistors (JLTs) is simulated on the basis of the multisubband Monte Carlo method, considering acoustic phonons, intervalley phonons, ionized impurities (IIs), and surface roughness (SR) scattering. It is demonstrated that JLTs can actually minimize the mobility degradation caused by SR scattering and improve the current drivability. On the other hand, II scattering is confirmed to degrade the current drivability compared with conventional MOSFETs with an intrinsic channel. However, the performance degradation in JLTs due to II scattering is shown to be insignificant, owing to the screening effect of free carriers and the forward scattering properties of high-speed carriers. Furthermore, by extracting a backscattering coefficient, the screening effect and the forward scattering properties are shown to more mitigate II scattering as the gate voltage increases.
Keywords :
MOSFET; Monte Carlo methods; backscatter; electromagnetic shielding; elemental semiconductors; silicon; surface roughness; MOSFET; Si; acoustic phonons; current drivability; double-gate JLT; forward scattering property; high-speed carriers; impurity scattering; intervalley phonons; intrinsic channel; ionized impurity; mobility degradation; multisubband Monte Carlo method; screening effect; silicon double-gate junctionless transistors; surface roughness effects; surface roughness scattering; IP networks; Impurities; Logic gates; MOSFET; Phonons; Scattering; Silicon; Backscattering coefficient; Monte Carlo method; ionized impurity (II) scattering; junctionless transistor (JLT); screening effect; surface roughness (SR) scattering; surface roughness (SR) scattering.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2015.2399954
Filename :
7042922
Link To Document :
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