Title :
Low-Ohmic Resistance Comparison: Measurement Capabilities and Resistor Traveling Behavior
Author :
Rietveld, Gert ; van der Beek, J.H.N. ; Kraft, Michael ; Elmquist, Randolph E. ; Mortara, Alessandro ; Jeckelmann, Beat
Author_Institution :
Van Swinden Lab., Nat. Metrol. Inst. of The Netherlands, Delft, Netherlands
Abstract :
The low-ohmic resistance measurement capabilities of the Van Swinden Laboratorium, National Institute of Standards and Technology, and the Federal Office of Metrology (METAS) were compared using a set of resistors with values 100 mΩ, 10 mΩ, 1 mΩ, and 100 μΩ, respectively. The measurement results of the three laboratories agree extremely well within the respective measurement uncertainties with the comparison reference value. Careful transport of the resistors was crucial for achieving this result. Still, some of the resistors showed steps in value at each transport which likely relates to the construction of the resistance elements of these resistors.
Keywords :
electric resistance measurement; measurement uncertainty; resistors; low ohmic resistance measurement; measurement uncertainty; resistor traveling behavior; Current measurement; Electrical resistance measurement; Laboratories; NIST; Resistance; Resistors; Temperature measurement; Comparison; low-ohmic measurements; precision measurements; resistance measurements; resistors; shunts; traveling behavior;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
DOI :
10.1109/TIM.2012.2225917