DocumentCode :
708317
Title :
The next generation 1200V Trench Clustered IGBT technology with improved trade-off relationship
Author :
Hong Yao Long ; Sweet, Mark R. ; De Souza, Maria Merlyne ; Narayanan, Ekkanath Madathil Sankara
Author_Institution :
Dept. of Electr. & Electron. Eng., Univ. of Sheffield, Sheffield, UK
fYear :
2015
fDate :
15-19 March 2015
Firstpage :
1266
Lastpage :
1269
Abstract :
In this paper, the characteristics of the next generation of 1200V Trench Clustered Insulated Gate Bipolar Transistor (TCIGBT) in Non Punch Through (NPT) technology, made under manufacturing conditions are presented for the first time. The techniques applied to this novel power device are high density of MOS cells in a ladder design with fine pattern process. The device structure and process are optimized to provide the best trade-off between energy losses and ruggedness for industrial power applications.
Keywords :
insulated gate bipolar transistors; ladder networks; power MOSFET; power bipolar transistors; MOS cell; NPT technology; TCIGBT; energy loss; fine pattern process; improved trade-off relationship; industrial power application; ladder design; next generation trench clustered IGBT technology; nonpunch through technology; power device; voltage 1200 V; Insulated gate bipolar transistors; Logic gates; Performance evaluation; Semiconductor device measurement; Temperature; Temperature measurement; Thyristors; 1200V CIGBT; IGBT; Vce(sat)-Eoff trade-off relationship; fine pattern process;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applied Power Electronics Conference and Exposition (APEC), 2015 IEEE
Conference_Location :
Charlotte, NC
Type :
conf
DOI :
10.1109/APEC.2015.7104510
Filename :
7104510
Link To Document :
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